Sidewall angle tuning in focused electron beam-induced processing

• Sangeetha Hari,
• Willem F. van Dorp,
• Johannes J. L. Mulders,
• Piet H. F. Trompenaars,
• Pieter Kruit and
• Cornelis W. Hagen

Beilstein J. Nanotechnol. 2024, 15, 447–456, doi:10.3762/bjnano.15.40

• occurs when the electron energy matches that of an anion state. Other dissociation channels, such as neutral dissociation (ND) and dissociative ionization (DI), are threshold processes, but their efficiency declines above roughly 100 eV because the interaction time with the molecule becomes too short

A combined gas-phase dissociative ionization, dissociative electron attachment and deposition study on the potential FEBID precursor [Au(CH₃)₂Cl]₂

• Elif Bilgilisoy,
• Ali Kamali,
• Thomas Xaver Gentner,
• Gerd Ballmann,
• Sjoerd Harder,
• Hans-Peter Steinrück,
• Hubertus Marbach and
• Oddur Ingólfsson

Beilstein J. Nanotechnol. 2023, 14, 1178–1199, doi:10.3762/bjnano.14.98

• , which in turn is critical to the resulting purity of the FEBID deposits. In general, electron-induced fragmentation processes are categorized as dissociative ionization (DI), dissociative electron attachment (DEA), dipolar dissociation (DD), and neutral dissociation (ND) [25]. To fully comprehend the

• cleanliness of the substrate. Although we have not considered neutral dissociation upon electron excitation in the current gas-phase experiments, it is clear that the electron-induced fragmentation of [Au(CH3)2Cl]2 is strongly influenced in the FEBID experiments as compared to the single collision conditions

Fragmentation of metal(II) bis(acetylacetonate) complexes induced by slow electrons

• Janina Kopyra and
• Hassan Abdoul-Carime

Beilstein J. Nanotechnol. 2023, 14, 980–987, doi:10.3762/bjnano.14.81

• electron energy range investigated in the present work, that is, below 10 eV, DEA, as well as neutral dissociation and dissociative ionization, are the mechanisms responsible for the efficient fragmentation of molecules. In the case of dissociative electron attachment, studied in the present work, the

Low-energy electron interaction and focused electron beam-induced deposition of molybdenum hexacarbonyl (Mo(CO)₆)

• Po-Yuan Shih,
• Maicol Cipriani,
• Christian Felix Hermanns,
• Jens Oster,
• Klaus Edinger,
• Armin Gölzhäuser and
• Oddur Ingólfsson

Beilstein J. Nanotechnol. 2022, 13, 182–191, doi:10.3762/bjnano.13.13

• ]. In general, there are four distinct electron-induced processes that lead to molecular fragmentation [13]. These are dissociative electron attachment (DEA), dissociative ionization (DI), neutral dissociation (ND) and dipolar dissociation (DD). The processes differ distinctly in their energy dependence

Irradiation-driven molecular dynamics simulation of the FEBID process for Pt(PF₃)₄

• Alexey Prosvetov,
• Alexey V. Verkhovtsev,
• Gennady Sushko and
• Andrey V. Solov’yov

Beilstein J. Nanotechnol. 2021, 12, 1151–1172, doi:10.3762/bjnano.12.86

• ) at higher electron energies. Neutral dissociation (ND) is another possible fragmentation channel [26], but experimental data on ND are scarce. Accounting for the ND fragmentation channel might lead to an increase of the fragmentation probability. This means that a given fragmentation probability will

Electron interactions with the heteronuclear carbonyl precursor H₂FeRu₃(CO)₁₃ and comparison with HFeCo₃(CO)₁₂: from fundamental gas phase and surface science studies to focused electron beam induced deposition

• Ragesh Kumar T P,
• Paul Weirich,
• Lukas Hrachowina,
• Marc Hanefeld,
• Ragnar Bjornsson,
• Helgi Rafn Hrodmarsson,
• Sven Barth,
• D. Howard Fairbrother,
• Michael Huth and
• Oddur Ingólfsson

Beilstein J. Nanotechnol. 2018, 9, 555–579, doi:10.3762/bjnano.9.53

• are adsorbed on surfaces, as is the case in FEBID. Furthermore, current gas phase experiments rely on the detection of charged fragments, leaving the potentially significant neutral dissociation [22][33][41] upon electron excitation largely unexplored. The single electron/molecule collision

• account for DEA and DI in the current experiments and we are blind to all fragmentation caused by neutral dissociation upon electron excitation. For Pt(PF3)4, it has been shown that the cross sections for electronic excitations are very significant [33] and it is reasonable to assume that the cross

Electron-driven and thermal chemistry during water-assisted purification of platinum nanomaterials generated by electron beam induced deposition

• Ziyan Warneke,
• Markus Rohdenburg,
• Jonas Warneke,
• Janina Kopyra and
• Petra Swiderek

Beilstein J. Nanotechnol. 2018, 9, 77–90, doi:10.3762/bjnano.9.10

• data for DEA and EI of MeCpPtMe3 as well as a detailed understanding of the fragmentation mechanisms following EI do not exist to the best of our knowledge. Furthermore, neutral dissociation (ND), a non-resonant process with a threshold comparable to EI and leading to the formation of uncharged

Response under low-energy electron irradiation of a thin film of a potential copper precursor for focused electron beam induced deposition (FEBID)

• Leo Sala,
• Iwona B. Szymańska,
• Céline Dablemont,
• Anne Lafosse and
• Lionel Amiaud

Beilstein J. Nanotechnol. 2018, 9, 57–65, doi:10.3762/bjnano.9.8

• efficient process is neutral dissociation (ND), which produces two neutral fragments. It is in competition with dipolar dissociation (DD), which produces two ions of opposite charges that can be further neutralized. In the low-energy range, below the two previously mentioned thresholds, the only efficient

• the non-resonant processes, dissociative ionisation and electronic excitation followed by dipolar or neutral dissociation, become more efficient with increasing energy. Fragmentation of perfluorocarboxylate ligands The perfluorobutyrate ligand desorption induced by electron impact is observed by the

Interactions of low-energy electrons with the FEBID precursor chromium hexacarbonyl (Cr(CO)₆)

• Jusuf M. Khreis,
• João Ameixa,
• Filipe Ferreira da Silva and
• Stephan Denifl

Beilstein J. Nanotechnol. 2017, 8, 2583–2590, doi:10.3762/bjnano.8.258

• backscattered electrons with the precursor molecules. LEE initiate chemical reactions on the surface by dissociative electron attachment (DEA) and dissociative electron ionization, as well as neutral dissociation. Those processes need to be well understood, in order to maximise the quality of deposited metal as

Electron beam induced deposition of silacyclohexane and dichlorosilacyclohexane: the role of dissociative ionization and dissociative electron attachment in the deposition process

• Ragesh Kumar T P,
• Sangeetha Hari,
• Krishna K Damodaran,
• Oddur Ingólfsson and
• Cornelis W. Hagen

Beilstein J. Nanotechnol. 2017, 8, 2376–2388, doi:10.3762/bjnano.8.237

•  1), dissociative ionization (DI; Equation 2), neutral dissociation (ND; Equation 3) and dipolar dissociation (DD; Equation 4) [13][14][15][16][17][18][19][20]. The respective reaction schemes for each of these pathways are: The double dagger (‡) signifies vibrational or electronic excitation, the

• same is true for electronic excitation upon electron impact [34]. However, no experimental information is available on actual cross sections for neutral dissociation upon such electronic excitations. This is due to the difficulties associated with the detection of the resulting neutral species and

Dissociative electron attachment to coordination complexes of chromium: chromium(0) hexacarbonyl and benzene-chromium(0) tricarbonyl

• Janina Kopyra,
• Paulina Maciejewska and
• Jelena Maljković

Beilstein J. Nanotechnol. 2017, 8, 2257–2263, doi:10.3762/bjnano.8.225

• molecules via various decomposition processes such as dissociative ionization (DI), dipolar dissociation (DD), neutral dissociation (ND), and dissociative electron attachment (DEA) [8]. These reactions occur with relatively high cross sections and typically result in partial fragmentation of the precursor

Comprehensive investigation of the electronic excitation of W(CO)₆ by photoabsorption and theoretical analysis in the energy region from 3.9 to 10.8 eV

• Mónica Mendes,
• Khrystyna Regeta,
• Filipe Ferreira da Silva,
• Nykola C. Jones,
• Søren Vrønning Hoffmann,
• Gustavo García,
• Chantal Daniel and
• Paulo Limão-Vieira

Beilstein J. Nanotechnol. 2017, 8, 2208–2218, doi:10.3762/bjnano.8.220

• of relevance to estimate neutral dissociation cross sections of W(CO)6, a precursor molecule in focused electron beam induced deposition (FEBID) processes, from electron scattering measurements. Keywords: cross sections; density functional theory (DFT) calculations; focused electron beam induced

• beam impinging on the surface where dissociative electron attachment (DEA) processes are relevant, although at those energies electron impact excitations yielding neutral dissociation are prevalent in detriment to DEA [25]. Gas-phase DEA studies in the electron energy range from 0 to 14 eV reported by

• electron impact ionisation studies on the appearance energies of bare tungsten hexacarbonyl [28], on the fragmentation pathways of W(CO)6 clusters [29] and on the complete ligand loss of weakly bound W(CO)6 dimer [30]. As far as neutral dissociation (ND) is concerned, Zlatar et al. [25] have reported on

Suppression of low-energy dissociative electron attachment in Fe(CO)₅ upon clustering

• Jozef Lengyel,
• Peter Papp,
• Štefan Matejčík,
• Jaroslav Kočišek,
• Michal Fárník and
• Juraj Fedor

Beilstein J. Nanotechnol. 2017, 8, 2200–2207, doi:10.3762/bjnano.8.219

• undergoes neutral dissociation. This yields an electron with very low residual energy that causes DEA in another precursor molecule and the resulting anion effectively reacts with the coordinatively unsaturated products of the neutral dissociation. Such a process – possibly very relevant at realistic FEBID

• , which is very fragmentative in the gas phase, becomes much less destructive in clusters, since the ligands are stabilized by caging. The electronic excitation and subsequent neutral dissociation (very effective in the gas phase [22][23]) manifests itself in clusters via self-scavenging as a synthesis

The role of low-energy electrons in focused electron beam induced deposition: four case studies of representative precursors

• Rachel M. Thorman,
• Ragesh Kumar T. P.,
• D. Howard Fairbrother and
• Oddur Ingólfsson

Beilstein J. Nanotechnol. 2015, 6, 1904–1926, doi:10.3762/bjnano.6.194

• FEBID, specifically, dissociative electron attachment, dissociative ionization, neutral dissociation, and dipolar dissociation, emphasizing the different nature and energy dependence of each process. We then explore the value of studying these processes through comparative gas phase and surface studies

• ; focused electron beam induced deposition (FEBID); low-energy electron-induced fragmentation; neutral dissociation; Review 1 Introduction Focused electron beam induced deposition (FEBID) [1][2][3] is a direct-write method capable of creating nanostructures with potential scientific and industrial

• impinging on a Ni(111) surface [6] and for 1 keV electrons impinging on a Ag(100) surface [9], along with the approximate electron energy ranges in which the principal electron induced processes are operative, i.e., dissociative electron attachment (DEA), neutral dissociation (ND), and dissociative

Radiation-induced nanostructures: Formation processes and applications

• Michael Huth

Beilstein J. Nanotechnol. 2012, 3, 533–534, doi:10.3762/bjnano.3.61

• . Different processes, such as dissociative electron attachment, neutral dissociation or dissociative ionization act together in breaking selected bonds in (mostly) metal–organic precursor molecules. On the other hand, low-energy electrons also play a role in the radiation damage induced by ionizing radiation